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Proceedings Paper

Ion beam sputtering of x-ray multilayer mirrors
Author(s): Peter Gawlitza; Stefan Braun; Georg Dietrich; Maik Menzel; Stefan Schädlich; Andreas Leson
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Paper Abstract

Ion beam sputtering has been applied for polishing, figuring and multilayer coating on silicon and quartz glass substrates for the fabrication of x-ray mirrors. For high-performance x-ray optics extremely low microroughnesses of the substrates have to be achieved. Particularly for low d-spacing multilayers (d = 1...2 nm) even small improvements of the surface quality result in significant performance gains of the mirrors. By ion beam polishing silicon substrate surfaces could be smoothed from 0.18 nm rms to 0.11 nm rms (AFM scan length = 5 μm). Furthermore figuring of spherical substrates into elliptical or parabolic surface contours has been developed and applied. Spherical quartz glass substrates with initial rms roughnesses of 0.73 nm and 0.52 nm show reduced roughnesses after figuring and multilayer coating of 0.26 nm and 0.10 nm using AFM scan lengths of 20 μm and 5 μm, respectively. The testing of the ion beam figured mirrors for the application as parallel beam and focussing optics shows very promising results: The comparison of collimating mirrors, produced either by ion beam figuring or bending, shows very similar x-ray intensities. However, the ion beam figured mirrors open the perspective for further reduced figure errors, improved long-term stability and 2-dimensional focusing.

Paper Details

Date Published: 16 September 2008
PDF: 11 pages
Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707703 (16 September 2008); doi: 10.1117/12.796830
Show Author Affiliations
Peter Gawlitza, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Stefan Braun, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Georg Dietrich, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Maik Menzel, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Stefan Schädlich, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Andreas Leson, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 7077:
Advances in X-Ray/EUV Optics and Components III
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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