Share Email Print
cover

Proceedings Paper

Measurement of optical near field of a nanoscale aperture
Author(s): Rui Guo; Wenhao Huang; Edward C. Kinzel; Arvind Raman; Xianfan Xu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Nanoscale apertures, especially high transmission nanoantennas, have been shown to have great potential for nanolithography as well as near-field measurements. This paper describes a method for mapping the near-field distribution as a function of distance from the aperture surface. The measurements are performed using a home-built near-field optical microscopy (NSOM) with home-made aperture probes. The force distance curve is used to determine the tip-sample distance. The calibrated NSOM system is then used to correlate the collected near-field optical distribution data with the distance from the surface. The in-plane optical images are obtained at a constant height by turning off the vertical position feedback. The experiment results show that this is a potential method to obtain three dimensional optical measurements of nano structures.

Paper Details

Date Published: 9 September 2008
PDF: 7 pages
Proc. SPIE 7042, Instrumentation, Metrology, and Standards for Nanomanufacturing II, 704207 (9 September 2008); doi: 10.1117/12.796765
Show Author Affiliations
Rui Guo, Univ. of Science & Technology of China (China)
Purdue Univ. (United States)
Wenhao Huang, Univ. of Science & Technology of China (China)
Edward C. Kinzel, Purdue Univ. (United States)
Arvind Raman, Purdue Univ. (United States)
Xianfan Xu, Purdue Univ. (United States)


Published in SPIE Proceedings Vol. 7042:
Instrumentation, Metrology, and Standards for Nanomanufacturing II
Michael T. Postek; John A. Allgair, Editor(s)

© SPIE. Terms of Use
Back to Top