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Proceedings Paper

New plasma processes for antireflective structures on plastics
Author(s): U. Schulz; P. Munzert; R. Leitel; N. Bollwahn; I. Wendling; N. Kaiser; A. Tünnermann
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Paper Abstract

A new technology based on plasma etching has been developed to produce antireflective surface structures. By choosing thin initial layers and variable plasma conditions, a broad range of nanostructures can be obtained on various polymers. A broadband antireflective effect can be achieved that is less sensitive to the incident angle of light compared to multilayer interference coatings. Thin layers of silica help in mechanical protection, especially if the structured surface is nearly enclosed by the protection layer. In addition, surfaces that show both antireflective properties and an antifogging effect have been prepared. Combinations of SiO2 and fluorine-containing layers were found to be useful in obtaining super-hydrophobic behavior. This advanced plasma etching is not limited to a special plasma source and the suitability of different plasma sources is discussed.

Paper Details

Date Published: 25 September 2008
PDF: 6 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 710107 (25 September 2008); doi: 10.1117/12.796705
Show Author Affiliations
U. Schulz, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
P. Munzert, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
R. Leitel, Friedrich-Schiller-Univ. (Germany)
N. Bollwahn, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
I. Wendling, Friedrich-Schiller-Univ. (Germany)
N. Kaiser, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
A. Tünnermann, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Friedrich-Schiller-Univ. (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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