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Proceedings Paper

Development of adaptive mirror for wavefront correction of hard x-ray nanobeam
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Paper Abstract

We present the development of a phase compensator for wavefront control of X-rays. The optical device is a 150 mm-long total reflection mirror, the shape of which can be curved by adjusting the bias voltages of 36 piezoelectric ceramic plates attached to the mirror. The mirror surface was smoothed and made flat by elastic emission machining. To achieve a high degree of the accuracy in the controllability of a curved line, a Fizeau interferometer is placed in front of the mirror surface to monitor its shape in the experiment. We will apply this device to the optical system for the realization of sub-10-nm hard X-ray focusing.

Paper Details

Date Published: 3 September 2008
PDF: 8 pages
Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707709 (3 September 2008); doi: 10.1117/12.796029
Show Author Affiliations
Takashi Kimura, Osaka Univ. (Japan)
Soichiro Handa, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Hirokatsu Yumoto, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Daisuke Yamakawa, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Kenji Tamasaku, Osaka Univ. (Japan)
SPring-8/RIKEN (Japan)
Yoshinori Nishino, SPring-8/RIKEN (Japan)
Makina Yabashi, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Tetsuya Ishikawa, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
SPring-8/RIKEN (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)
Research Ctr. for Ultra-Precision Science & Technology (Japan)


Published in SPIE Proceedings Vol. 7077:
Advances in X-Ray/EUV Optics and Components III
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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