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Proceedings Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction
Author(s): Masaki Yamabe
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Paper Abstract

As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started 4-year program for mask manufacturing cost reduction by total optimization of MDP, mask writing, and mask inspection. The total optimization is accomplished by close relationship and synergism of three fields, MDP, mask writing, and mask inspection. And also, the total optimization will be accomplished by sharing four key items, common data format, good use of repeating patterns, pattern prioritization based on design intent, and parallel processing. In this paper, we describe functions of these four key items in the three fields and present status of development.

Paper Details

Date Published: 19 May 2008
PDF: 8 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280V (19 May 2008); doi: 10.1117/12.796014
Show Author Affiliations
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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