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Proceedings Paper

The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures
Author(s): Meredith J. Hampton; Stuart S. Williams; Zhilian Zhou; Janine Nunes; Doo-Hyun Ko; Joseph L. Templeton; Joseph M. DeSimone; Edward T. Samulski
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Paper Abstract

The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm "hard" inorganic oxides and nanocrystalline semiconductors and "soft" semiconducting polymers including TiO2, SnO2, ZnO, ITO, BaTiO3, CdSe, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3',7'-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. Additionally, PRINT has been employed to pattern features with aspect ratios greater than 1, deposit a second layer of features on top of an initial layer without pattern destruction, and replicate sub-100 nm sized features for photovoltaics applications. Materials and patterns generated in this work were characterized using a variety of techniques including: Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-ray Diffraction (XRD).

Paper Details

Date Published: 11 September 2008
PDF: 9 pages
Proc. SPIE 7047, Nanoscale Photonic and Cell Technologies for Photovoltaics, 70470T (11 September 2008); doi: 10.1117/12.794890
Show Author Affiliations
Meredith J. Hampton, The Univ. of North Carolina at Chapel Hill (United States)
Stuart S. Williams, The Univ. of North Carolina at Chapel Hill (United States)
Zhilian Zhou, Liquidia Technologies, Inc. (United States)
Janine Nunes, The Univ. of North Carolina at Chapel Hill (United States)
Doo-Hyun Ko, The Univ. of North Carolina at Chapel Hill (United States)
Joseph L. Templeton, The Univ. of North Carolina at Chapel Hill (United States)
Joseph M. DeSimone, The Univ. of North Carolina at Chapel Hill (United States)
North Carolina State Univ. (United States)
Edward T. Samulski, The Univ. of North Carolina at Chapel Hill (United States)


Published in SPIE Proceedings Vol. 7047:
Nanoscale Photonic and Cell Technologies for Photovoltaics
Loucas Tsakalakos, Editor(s)

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