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Proceedings Paper

Multilayer alumina and titania optical coatings prepared by atomic layer deposition
Author(s): Nemo Biluš Abaffy; Peter Evans; Gerry Triani; Dougal McCulloch
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Paper Abstract

The microstructure and optical properties of alumina and titania multilayer coatings prepared using atomic layer deposition (ALD) has been investigated. The titania layers were prepared using TiCl4+H2O as the precursors while two different precursors, Al(CH3)3+H2O and AlCl3+H2O, were used to deposit the alumina layers. The results show that ALD can be used to produce amorphous, stoichiometric alumina and titania thin films with uniform thicknesses at low temperatures (120 °C). An antireflective coating design based on 4 alternating layers of titania and alumina was prepared and the resulting reflectance compared to theoretical calculations. The results demonstrate that ALD is a suitable technique for the deposition of optical thin films at temperatures compatible with thermally sensitive substrates.

Paper Details

Date Published: 10 September 2008
PDF: 10 pages
Proc. SPIE 7041, Nanostructured Thin Films, 704109 (10 September 2008); doi: 10.1117/12.794618
Show Author Affiliations
Nemo Biluš Abaffy, Royal Melbourne Institute of Technology (Australia)
Peter Evans, Australian Nuclear Science and Technology Organisation (Australia)
Gerry Triani, Australian Nuclear Science and Technology Organisation (Australia)
Dougal McCulloch, Royal Melbourne Institute of Technology (Australia)


Published in SPIE Proceedings Vol. 7041:
Nanostructured Thin Films
Geoffrey B. Smith; Akhlesh Lakhtakia, Editor(s)

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