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Proceedings Paper

Uncertainty analysis on the absolute thickness of a cavity using a commercial wavelength scanning interferometer
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Paper Abstract

Wavelength scanning interferometry offers many advantages over traditional phase shifting interferometry, most significantly the elimination of mechanical movement of the part/s for phase modulation by implementing a tunable light source. Further, Fourier analysis on the interference time history enables this technique to accurately measure distances, treating the distance between two optical surfaces as an interferometric cavity. We propose to evaluate the uncertainty in the thickness measurement of a transparent cavity using a commercial Fizeau wavelength scanning interferometer. This work follows the theory and measurement performed in a previous manuscript of measuring absolute distances of opaque objects using a commercial wavelength scanning interferometer. The limits in measuring a cavity using the commercial wavelength scanning interferometer depend on many factors such as temperature variations that affect the test and reference cavity, uncertainty in the reference cavity calibration, tuning rate non-linearities, etc. In addition to an analytical approach, a simulation is described to better understand the measurement process and the uncertainty associated in measuring absolute distances (thickness) of cavities. Preliminary experimental results on the absolute thickness of a transparent cavity are reported along with uncertainty sources.

Paper Details

Date Published: 11 August 2008
PDF: 12 pages
Proc. SPIE 7063, Interferometry XIV: Techniques and Analysis, 70630R (11 August 2008); doi: 10.1117/12.793772
Show Author Affiliations
Amit Suratkar, Univ. of North Carolina at Charlotte (United States)
Young-Sik Ghim, Univ. of North Carolina at Charlotte (United States)
Angela Davies, Univ. of North Carolina at Charlotte (United States)


Published in SPIE Proceedings Vol. 7063:
Interferometry XIV: Techniques and Analysis
Joanna Schmit; Katherine Creath; Catherine E. Towers, Editor(s)

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