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Proceedings Paper

Integrated optics based on plasma processed dielectric materials
Author(s): T. Begou; B. Bêche; J. P. Landesman; E. Gaviot; A. Soussou; K. Makaoui; M. P. Besland; A. Granier; A. Goullet
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Paper Abstract

A first generation of dielectric rib waveguides has been designed and shaped to support a monomode confinement by using organosilicon materials elaborated by plasma enhanced chemical vapor deposition (PECVD). Optical losses have been measured around 5.5dB.cm-1 and 11.5dB.cm-1 for TE00 and TM00 modes, respectively. Then, synthesis of titanium dioxide thin films by PECVD has been investigated to improve optical and propagation properties. The first results on these films exhibit a refractive index around 1.99 at a 633 nm wavelength with a 380 nm optical gap. When an rf bias is applied to the substrate, the refractive index reaches 2.36, from -5V, without significant optical gap variation.

Paper Details

Date Published: 29 August 2008
PDF: 11 pages
Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 706705 (29 August 2008); doi: 10.1117/12.793690
Show Author Affiliations
T. Begou, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
B. Bêche, Institut de Physique, Univ. de Rennes I, UMR CNRS 6251 (France)
J. P. Landesman, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
E. Gaviot, Lab. d'Acoustique, Univ. du Maine, CNRS (France)
A. Soussou, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
K. Makaoui, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
M. P. Besland, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
A. Granier, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)
A. Goullet, Institut des Matériaux Jean Rouxel, Univ. de Nantes, PCM UMR CNRS 6502 (France)


Published in SPIE Proceedings Vol. 7067:
Advances in Thin-Film Coatings for Optical Applications V
Jennifer D. T. Kruschwitz; Michael J. Ellison, Editor(s)

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