Share Email Print

Proceedings Paper

Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The use of extreme ultraviolet radiation (XUV/EUV) enables a variety of new optical and analytical techniques such as EUV-lithography, -microscopy but also -reflectometry. Due to the strong interaction of XUV with matter, grazing-incidence reflectometry in the 1-40 nm range has proven to be a surface sensitive technique to characterize thin-film structures on the nanometer scale. Chemical composition, thickness and surface roughness of a deposited layer system can be determined indirectly from its reflectivity curve by non-linear regression techniques and the combined Nevot Croce- and general transfer matrix formalism for X-ray reflectivity. Here the reflectivity can either be determined as a function of incident wavelength at a fixed grazing angle or vice versa. This way it is even possible to specify a root-mean-square (rms) surface roughness of hidden layer-interfaces in the depth of a stack. To date, such measurements in the XUV have only been carried out at synchrotron facilities prohibiting an easy access to a broad range of users. Taking into account the recent progress in the development of short wavelength sources and optics, laboratory-scale, plasma-based XUV light-sources are becoming an attractive option for compact devices. Along with our simulations we present our experimental work on an off-synchrotron XUV-reflectometer for characterization of thin-film structures. The device can also be utilized to carry out scattered light measurements from ultra smooth surfaces, e.g. wafers, for defect inspection.

Paper Details

Date Published: 3 September 2008
PDF: 10 pages
Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707714 (3 September 2008); doi: 10.1117/12.793364
Show Author Affiliations
Matus Banyay, RWTH Aachen Univ. (Germany)
Larissa Juschkin, RWTH Aachen Univ. (Germany)

Published in SPIE Proceedings Vol. 7077:
Advances in X-Ray/EUV Optics and Components III
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

© SPIE. Terms of Use
Back to Top