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Proceedings Paper

Innovative approaches to surface sensitive analysis techniques on the basis of plasma-based off-synchrotron XUV/EUV light sources
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Paper Abstract

The use of extreme ultraviolet radiation (XUV/EUV) enables a variety of new optical and analytical techniques such as EUV-lithography, -microscopy but also -reflectometry. Due to the strong interaction of XUV with matter, grazing-incidence reflectometry in the 1-40 nm range has proven to be a surface sensitive technique to characterize thin-film structures on the nanometer scale. Chemical composition, thickness and surface roughness of a deposited layer system can be determined indirectly from its reflectivity curve by non-linear regression techniques and the combined Nevot Croce- and general transfer matrix formalism for X-ray reflectivity. Here the reflectivity can either be determined as a function of incident wavelength at a fixed grazing angle or vice versa. This way it is even possible to specify a root-mean-square (rms) surface roughness of hidden layer-interfaces in the depth of a stack. To date, such measurements in the XUV have only been carried out at synchrotron facilities prohibiting an easy access to a broad range of users. Taking into account the recent progress in the development of short wavelength sources and optics, laboratory-scale, plasma-based XUV light-sources are becoming an attractive option for compact devices. Along with our simulations we present our experimental work on an off-synchrotron XUV-reflectometer for characterization of thin-film structures. The device can also be utilized to carry out scattered light measurements from ultra smooth surfaces, e.g. wafers, for defect inspection.

Paper Details

Date Published: 3 September 2008
PDF: 10 pages
Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707714 (3 September 2008); doi: 10.1117/12.793364
Show Author Affiliations
Matus Banyay, RWTH Aachen Univ. (Germany)
Larissa Juschkin, RWTH Aachen Univ. (Germany)


Published in SPIE Proceedings Vol. 7077:
Advances in X-Ray/EUV Optics and Components III
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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