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Proceedings Paper

Comparison of verification methods for OASIS files: hierarchical or flat?
Author(s): Kokoro Kato; Yoshiyuki Taniguchi; Masakazu Endo; Kuninori Nishizawa; Tadao Inoue; Toshiaki Fujii
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Paper Abstract

In order to go through the transition term from GDSII to OASIS successfully, the aid of the verification tools between OASIS and GDSII is necessary. In general, we have two methods of OASIS file verification. One is a hierarchical method that checks between GDSII and OASIS by each cell level. The other is a flat method that merges each pattern through its hierarchy into a flat level and compares the flattened geometry one by one. We did the experiments of comparison between two methods for OASIS to GDSII verification. The software tool called 'ogdiff' has been used for a hierarchical verification experiment. We used SmartMRC for the flat method experiment. In this paper, we show the experimental results of comparison and we also address the pros and cons of each method. Then we suggest which method is preferable for specific cases.

Paper Details

Date Published: 19 May 2008
PDF: 8 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702834 (19 May 2008); doi: 10.1117/12.793111
Show Author Affiliations
Kokoro Kato, SII NanoTechnology Inc. (Japan)
Yoshiyuki Taniguchi, SII NanoTechnology Inc. (Japan)
Masakazu Endo, SII NanoTechnology Inc. (Japan)
Kuninori Nishizawa, SII NanoTechnology Inc. (Japan)
Tadao Inoue, SII NanoTechnology Inc. (Japan)
Toshiaki Fujii, SII NanoTechnology Inc. (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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