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Proceedings Paper

Advanced mask data processing for 32nm and beyond
Author(s): John Nogatch; Dan Hung; Raghava Kondepudy; Johnny Yeap
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Paper Abstract

Smaller feature sizes and aggressive Reticle Enhancement Techniques have led to greatly increased mask data file sizes, longer processing times, and shrinking error budgets. Improvements to Mask Data Preparation software can mitigate these trends. Processing time can be reduced by using algorithms which are compatible with scalable multi-core Distributed Processing. Increased pattern uniformity in the fractured output can reduce Critical Dimension variation on the finished mask plate. Procedures for estimating pattern uniformity and CD variation are described.

Paper Details

Date Published: 19 May 2008
PDF: 9 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702833 (19 May 2008); doi: 10.1117/12.793108
Show Author Affiliations
John Nogatch, Synopsys, Inc. (United States)
Dan Hung, Synopsys, Inc. (United States)
Raghava Kondepudy, Synopsys, Inc. (United States)
Johnny Yeap, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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