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Proceedings Paper

Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy
Author(s): Masaaki Kurihara; Sho Hatakeyama; Kouji Yoshida; Makoto Abe; Daisuke Totsukawa; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi
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Paper Abstract

Most of photomask issues such as pattern collapse, HAZE, and cleaning damage relate to behavior of mask surfaces. Therefore it is coming to be important to control surface energy in photomask processes. Especially adhesion analysis in micro region is strongly desired to optimize material and process designs in photomask fabrication. Quantitative measurements of adhesive forces of resists on photomask blanks were realized with scanning probe microscopy (SPM) techniques. Then surface energy on photomask blanks was able to be controlled by modification with some silanization reagents. In addition, adhesive forces of resists on surfaces modified with some silanes were able to be also controlled. The SPM method is proved to be effective for measuring adhesive energy of micro patterns on photomask blanks.

Paper Details

Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282T (19 May 2008); doi: 10.1117/12.793099
Show Author Affiliations
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Sho Hatakeyama, Dai Nippon Printing Co., Ltd. (Japan)
Kouji Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Makoto Abe, Dai Nippon Printing Co., Ltd. (Japan)
Daisuke Totsukawa, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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