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Proceedings Paper

Comparison of TeraStar SL1, TeraScanHR DDR, DDT and SL2 to identify an efficient mask re-qualification inspection mode for 7Xnm half pitch design node production reticles in advanced memory wafer fab
Author(s): Koji Kaneko; Takanobu Kobayashi; Jinggang Zhu; Norihiko Takatsu; Paul Yu; Kosuke Ito; Toshiaki Kojima; Yoshinori Nagaoka
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Paper Abstract

This paper discusses the most efficient mask re-qualification inspection mode for 7Xnm half pitch design node production memory reticles in advanced memory wafer fab. By comparing overall performance including inspectability, sensitivity, and throughput for 8 different inspection modes, P150 Pixel Die-to-Die Reflected Light (P150 DDR) was identified to be the most desirable inspection mode for the specific use case where only one inspection mode is available. The evaluation was executed on the most critical layers - active, gate and contact layer. P150 DDR demonstrates the capability of providing early warning for the crystal growth type defects on both quartz and MoSi surfaces. It also showed good sensitivity for capturing small contamination defects in the dense Line/Space or Contact/Hole pattern areas. With a fast inspection scan speed and easy to use set up, TeraScanHR P150 DDR offers the best cost of ownership among all inspection modes. To gain higher sensitivity for smaller design nodes, TeraScanHR P150 DDR can be easily extended to smaller inspection pixels with minimum impact on productivity.

Paper Details

Date Published: 19 May 2008
PDF: 8 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282M (19 May 2008); doi: 10.1117/12.793092
Show Author Affiliations
Koji Kaneko, Elpida Memory, Inc. (Japan)
Takanobu Kobayashi, Elpida Memory, Inc. (Japan)
Jinggang Zhu, KLA-Tencor Corp. (United States)
Norihiko Takatsu, KLA-Tencor Corp. (United States)
Paul Yu, KLA-Tencor Corp. (United States)
Kosuke Ito, KLA-Tencor Corp. (United States)
Toshiaki Kojima, KLA-Tencor Corp. (United States)
Yoshinori Nagaoka, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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