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Proceedings Paper

Results of new CD detection capability on advanced reticles
Author(s): Arosha Goonesekera; Heiko Schmalfuss; Isaac Lee; Chun Guan; Aditya Dayal; Thomas Schulmeyer; Jan Heumann
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Paper Abstract

Semiconductor device manufacturers have made technological advances in fabricating devices at 65nm and 45nm nodes. Technology is advancing towards 32nm node devices. Reticles at these device nodes are designed with tight critical dimension (CD) specifications and sub-resolution features. Inspection tools capable of detecting CD defects on the order of 20 nm are required to accommodate these device nodes. To meet this challenge, KLA-Tencor has developed a new "CD Detector" capability on the TeraScanHR reticle inspection tool that efficiently detects two-sided CD defects on reticles at the 45nm node and beyond. The CD Detector is available in both Die-to-Die (DD) and Die-to-Database (DB) inspection modes. This paper presents results of a CD Detector Beta evaluation on variety of advanced reticles in a production setting at Advanced Mask Technology Center (AMTC) in Germany. Inspection results will demonstrate improved sensitivity to two-sided CD defects and good inspectability, at inspection times similar to a standard HiRes inspection. Discussion will focus on enabling the highest sensitivity to CD defects at 72nm pixel inspections, which is suitable for advanced research and development studies, as well as improved sensitivity at 90nm pixel inspections for higher productivity.

Paper Details

Date Published: 19 May 2008
PDF: 10 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282L (19 May 2008); doi: 10.1117/12.793091
Show Author Affiliations
Arosha Goonesekera, KLA-Tencor Corp. (United States)
Heiko Schmalfuss, KLA-Tencor Corp. (United States)
Isaac Lee, KLA-Tencor Corp. (United States)
Chun Guan, KLA-Tencor Corp. (United States)
Aditya Dayal, KLA-Tencor Corp. (United States)
Thomas Schulmeyer, Advanced Mask Technology Ctr. (Germany)
Jan Heumann, Advanced Mask Technology Ctr. (Germany)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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