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Proceedings Paper

An explosive haze formation under low energy exposure
Author(s): Junsik Lee; Yongdae Kim; Yongkyoo Choi; Changreol Kim
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Paper Abstract

Haze formation on reticle continues to be a significant source of concern for the photolithography. Possible sources and causes continue to be investigated. This paper provides a haze source evaluation result under the sub-pellicle defect on the mask. It is well known that there are several sources to produce the haze. One is inorganic molecules such as SOx, NH3, H2O and CO2. The haze formation of inorganic sources is promoted for growing defect size by the exposure energy in time. The other is organics that are prevalent Fab and storage environment. In this paper, we deal with the haze that is immediately generating with a low energy exposure. Especially, this study treats the haze source during the mask packaging method.

Paper Details

Date Published: 19 May 2008
PDF: 9 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282B (19 May 2008); doi: 10.1117/12.793085
Show Author Affiliations
Junsik Lee, Hynix Semiconductor Inc. (South Korea)
Yongdae Kim, Hynix Semiconductor Inc. (South Korea)
Yongkyoo Choi, Hynix Semiconductor Inc. (South Korea)
Changreol Kim, Hynix Semiconductor Inc. (South Korea)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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