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Proceedings Paper

UV-NIL mask making and imprint evaluation
Author(s): Akiko Fujii; Yuko Sakai; Jun Mizuochi; Takaaki Hiraka; Satoshi Yusa; Koki Kuriyama; Masashi Sakaki; Takanori Sutou; Shiho Sasaki; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi
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Paper Abstract

UV NIL shows excellent resolution capability with remarkable low line edge roughness, and has been attracting pioneers in the industry who were searching for the finest patterns. We have been focused on the resolution improvement in mask making, and with a 100kV acceleration voltage EB writer process, we have achieved down to 18nm resolution, and have established a mask making process to meet the requirements of the pioneers. Usually such masks needed just a small field (several hundred microns square or so). Now, UV NIL exploration seems to have reached the step of feasibility study for mass production. Here, instead of a small field, a full chip field mask is required, though the resolution demand is not as tough as for the extremely advanced usage. The 100kV EB writers are adopting spot beams to generate the pattern and have a fatally low throughput if we need full chip writing. In this work, we focused on the 50keV variable shaped beam (VSB) EB writers, which are used in current 4X photomask manufacturing. The 50kV VSB writers can generate full chip pattern in a reasonable time, and by choosing the right patterning material and process, we could achieve resolution down to 32nm. Our initial results of 32nm class NIL masks with full chip field size will be shown and resolution improvement plan to further technology nodes will be discussed.

Paper Details

Date Published: 19 May 2008
PDF: 12 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70281W (19 May 2008); doi: 10.1117/12.793073
Show Author Affiliations
Akiko Fujii, Dai Nippon Printing Co., Ltd. (Japan)
Yuko Sakai, Dai Nippon Printing Co., Ltd. (Japan)
Jun Mizuochi, Dai Nippon Printing Co., Ltd. (Japan)
Takaaki Hiraka, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi Yusa, Dai Nippon Printing Co., Ltd. (Japan)
Koki Kuriyama, Dai Nippon Printing Co., Ltd. (Japan)
Masashi Sakaki, Dai Nippon Printing Co., Ltd. (Japan)
Takanori Sutou, Dai Nippon Printing Co., Ltd. (Japan)
Shiho Sasaki, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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