Share Email Print

Proceedings Paper

Reliable measurement method for complicated OPC pattern
Author(s): Tastuya Aihara; Shinpei Kondo; Masaru Higuchi
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The application of aggressive Optical Proximity Correction (OPC) has permitted the extension of advanced lithographic technologies. OPC is also the source of challenges for the mask-maker. Small shapes between features and highly-fragmented edges in the design data are difficult to reproduce on masks and even more difficult to measure exactly with CD-SEM, which requires not only tool stability but also better measurement methods. To cope with this problem, we have been focusing on finding better methods for measuring actual mask Critical Dimension (CD) that would show a good correlation to wafer CD. In BACUS 2006, we presented an effective measurement for closed patterns, which is "area measurement". In time paper we are introducing new potential solution, which include a reliable method, distance measurement, for certain types of unclosed patterns. For instance, we evaluated an unclosed pattern which couldn't be measured with Region of Interest (ROI) that is large enough, and found a reliable method, Distance ROI. Though the method has a major drawback of image tilt, we also found an approach to avoid this. Finally we verified that Distance ROI could be new solution for unclosed patterns by jointly applying tilt monitoring, beam rotation correction, and area scan.

Paper Details

Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70281N (19 May 2008); doi: 10.1117/12.793064
Show Author Affiliations
Tastuya Aihara, Toppan Printing Co., Ltd. (Japan)
Shinpei Kondo, Toppan Electronics Inc. (United States)
Masaru Higuchi, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

© SPIE. Terms of Use
Back to Top