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Proceedings Paper

Fast integrated die-to-die transmitted, reflected and STARlight-2 defect inspection on memory masks
Author(s): Andy Lan; Jenny Hsu; Swapnajit Chakravarty; Vincent Hsu; Ellison Chen; Eric Lu; John Miller
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Paper Abstract

Single mode inspections, using die-to-die Transmitted (ddT) or die-to-die Reflected (ddR) modes, provides a high level of sensitivity to opaque and clear defects on reticles. Die-to-die (DD) inspections however, cannot inspect the scribes or frames which are potential locations for haze growth. Historically, STARLight-2TM (SL2) has been the only mode effectively utilized for contamination inspection in reticle scribes and frames. However, SL2 is designed for identifying contamination and not pattern defects on a mask. The solution presented here is Fast Integrated Inspection which includes ddT, ddR, and SL2, and allows the user to inspect a reticle for pattern and contamination defects over patterned areas and scribes simultaneously, and in unit time.

Paper Details

Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70281J (19 May 2008); doi: 10.1117/12.793060
Show Author Affiliations
Andy Lan, Inotera Memory Inc. (Taiwan)
Jenny Hsu, Inotera Memory Inc. (Taiwan)
Swapnajit Chakravarty, KLA-Tencor Corp. (United States)
Vincent Hsu, KLA-Tencor Corp. (United States)
Ellison Chen, KLA-Tencor Corp. (United States)
Eric Lu, KLA-Tencor Corp. (United States)
John Miller, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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