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Proceedings Paper

AF fixer: new incremental OPC method for optimizing assist feature
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Paper Abstract

Due to shrinking design nodes and to some limitations of scanners, extreme off-axis illumination (OAI) required and its use and implementation of assist features (AF) to solve depth of focus (DOF) problems for isolated features and specific pitch regions is essential. But unfortunately, the strong periodic character of OAI illumination makes AF's print more easily. Present OPC flows generate AFs before OPC, which is also causes some AF printing problems. At present, mask manufacturers must downsize AF's below 30nm to solve this problem. This is challenging and increases mask cost. We report on an AF-fixer tool which is able to check AF printability and correct weak points with minimal cost in terms of DOF after OPC. We have devised an effective algorithm that removes printing AF's. It can not only search for the best non-printing AF condition to meet the DOF spec, but also reports uncorrectable spots, which could be marked as design errors. To limit correction times and to maximize DOF in full-chip correction, a process window (PW) model and incremental OPC method are applied. This AF fixer, which suggests optimum AF in only weak point region, solves AF printing problems economically and accurately.

Paper Details

Date Published: 19 May 2008
PDF: 6 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280Y (19 May 2008); doi: 10.1117/12.793040
Show Author Affiliations
Sung-Gon Jung, Samsung Electronics Co., Ltd. (South Korea)
Sang-Wook Kim, Samsung Electronics Co., Ltd. (South Korea)
Sung-Soo Suh, Samsung Electronics Co., Ltd. (South Korea)
Young-Chang Kim, Samsung Electronics Co., Ltd. (South Korea)
Suk-Joo Lee, Samsung Electronics Co., Ltd. (South Korea)
Sung-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)
Levi D. Barnes, Synopsys, Inc. (United States)
Xiaohai Li, Synopsys, Inc. (United States)
Robert M. Lugg, Synopsys, Inc. (United States)
Sooryong Lee, Synopsys, Inc. (United States)
Kyoil Koo, Synopsys, Inc. (United States)
Munhoe Do, Synopsys, Inc. (United States)
Frank P. Amoroso, Synopsys, Inc. (United States)
Benjamin Painter, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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