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Proceedings Paper

Scanner fleet management utilizing programmed hotspot patterns
Author(s): Kenji Yoshida; Soichi Inoue; Koji Hashimoto; Satoshi Tanaka; Masaki Satake; Takashi Obara; Kazuhiro Takahata; Eiji Yamanaka; Mitsuyo Kariya; Hiroyuki Morinaga; Shoji Mimotogi
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Paper Abstract

This paper proposes new scanner fleet management utilizing programmed hotspot patterns. We have developed a methodology to control and adjust critical parameters of scanner, such as effective illumination shape and numerical aperture (NA), to obtain the same lithography performance. The purpose is to improve hotspot patterns and depth of focus (DOF) of each scanner. The method is carried out with a test mask having programmed hotspot patterns that are likely to become fatal errors for circuit reliability in wafer processing. Actual circuit patterns whose patterning fidelity is sensitive to the critical parameters are selected as the programmed hotspots. The mask also has various lithography process monitor marks, such as flare monitor pattern, MEF evaluation pattern and aberration monitor pattern, for OPE control and simulation. Using the same test mask for every scanner, we can reveal the variation of lithography performance within a "scanner fleet". The hotspot patterns on the mask and the patterns printed onto wafers are inspected by Die-to-Database (D2DB) EB inspection and a wafer D2DB EB inspection, respectively. Using those D2DB inspection systems, we can evaluate quantitatively the change of pattern shape from drawing data to wafer. The OPE adjustment and OPC feedback are corrected by using the simulation data acquired for the D2DB inspection. The quality of the evaluation provides accurate scanner fleet control, resulting in high productivity and cost effectiveness at wafer fabrication.

Paper Details

Date Published: 19 May 2008
PDF: 12 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280W (19 May 2008); doi: 10.1117/12.793038
Show Author Affiliations
Kenji Yoshida, Toshiba Corp. (Japan)
Soichi Inoue, Toshiba Corp. (Japan)
Koji Hashimoto, Toshiba Corp. (Japan)
Satoshi Tanaka, Toshiba Corp. (Japan)
Masaki Satake, Toshiba Corp. (Japan)
Takashi Obara, Toshiba Corp. (Japan)
Kazuhiro Takahata, Toshiba Corp. (Japan)
Eiji Yamanaka, Toshiba Corp. (Japan)
Mitsuyo Kariya, Toshiba Corp. (Japan)
Hiroyuki Morinaga, Toshiba Corp. (Japan)
Shoji Mimotogi, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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