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Proceedings Paper

OPC model enhancement using parameter sensitivity methodology
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Paper Abstract

An approach to parameter sensitivity methodology for OPC modeling is enhanced, automated, and applied to generate production-quality models for a 32-nm logic node poly layer. Two parameter sensitivity models are generated and compared to a baseline model from the same experimental dataset. The three models are thoroughly investigated to demonstrate that parameter sensitivity can enhance advanced OPC models with essentially no impact on the time required for model optimization. Results also indicate that parameter sensitivity, if used improperly, can decrease model quality.

Paper Details

Date Published: 19 May 2008
PDF: 11 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280N (19 May 2008); doi: 10.1117/12.793030
Show Author Affiliations
Brian S. Ward, Synopsys, Inc. (Belgium)
Martin Drapeau, Synopsys, Inc. (Canada)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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