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Proceedings Paper

Selete EUV reticle shipping and storage test results
Author(s): Kazuya Ota; Mitsuaki Amemiya; Takao Taguchi; Osamu Suga
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Paper Abstract

To protect the reticle during shipping and storage, several reticle pod concepts have been proposed and evaluated in the last 10 years. MIRAI-Selete has been developing EUV reticle handling technology and evaluating EUV reticle pods for two years. In this paper, we report results of shipping tests and storage tests using CNE pods; the CNE pod is designed by Entegris using "Dual Pod Concept" which Canon and Nikon jointly proposed in 2004. The pod consists of an inner pod and an outer pod. The inner pod has two components, a baseplate and a cover; the base plate protects the reticle front surface and the cover protects the back surface from particle contamination in shipping, storage and loading to a reticle chuck in an exposure tool. The outer pod is a RSP-200 slightly modified to contain the inner pod in it. We carried out thirty shipping tests and several storage tests and found the CNE pods had very promising protecting performance during shipping and storage.

Paper Details

Date Published: 19 May 2008
PDF: 8 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280I (19 May 2008); doi: 10.1117/12.793025
Show Author Affiliations
Kazuya Ota, MIRAI-Semiconductor Leading Edge Technologies, Inc. (Japan)
Mitsuaki Amemiya, MIRAI-Semiconductor Leading Edge Technologies, Inc. (Japan)
Takao Taguchi, MIRAI-Semiconductor Leading Edge Technologies, Inc. (Japan)
Osamu Suga, MIRAI-Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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