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Proceedings Paper

Multi column cell (MCC) e-beam exposure system for mask writing
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Paper Abstract

Association of Super-Advanced Electronics Technologies (ASET) Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) started a 4-year development program for the total optimization of mask design, drawing, and inspection technologies to reduce photomask manufacturing costs in 2006. At the Mask Writing Equipment Technology Research Laboratory, we are developing an e-beam exposure system introducing concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam), which has several times higher throughput than currently commercially available e-beam writing systems.

Paper Details

Date Published: 19 May 2008
PDF: 9 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70280B (19 May 2008); doi: 10.1117/12.793019
Show Author Affiliations
Hiroshi Yasuda, Association of Super-Advanced Electronics Technologies (Japan)
Akio Yamada, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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