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Proceedings Paper

Influence of substrates on the nucleation behaviour of nanocrystalline diamond films
Author(s): Jinyong Xu; Yiben Xia; Linjun Wang; Jianmin Liu; Jian Huang; Hongyan Pen; Guang Hu; Xuefeng Zhu
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Paper Abstract

Nanocrystalline diamond (NCD) films have been deposited by hot filament chemical vapour deposition (HFCVD) from acetone/hydrogen gas mixtures on a variety of substrates such as silicon wafers and polycrystalline diamond. The influence of the chemical nature of the substrate, the roughness, and the pretreatment of the substrates on the nucleation and the bulk structure of the NCD films are investigated. By means of X-ray diffraction (XRD) and Raman spectroscopy it is shown that the bulk properties of the films are not affected by the status of the substrate although these have a strong influence on the nucleation behaviour.

Paper Details

Date Published: 11 March 2008
PDF: 5 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698418 (11 March 2008); doi: 10.1117/12.792392
Show Author Affiliations
Jinyong Xu, Shanghai Univ. (China)
Yiben Xia, Shanghai Univ. (China)
Linjun Wang, Shanghai Univ. (China)
Jianmin Liu, Shanghai Univ. (China)
Jian Huang, Shanghai Univ. (China)
Hongyan Pen, Shanghai Univ. (China)
Guang Hu, Shanghai Univ. (China)
Xuefeng Zhu, Shanghai Univ. (China)


Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications

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