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Proceedings Paper

Thick and adherent (cBN/nano-diamond)3 multilayer films deposited by RF magnetron sputtering
Author(s): H. Q. Li; K. M. Leung; W. J. Zhang
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Paper Abstract

Using physical vapor deposition (PVD) method, the (cBN/nano-diamond)3 multilayer film with phase purity, high hardness and low residual stress was synthesized on silicon substrates supported by a thick nano-diamond buffer. This method presented is characteristic with the direct cBN growth on diamond without soft, non-cubic BN interface layers; the synthesis of multilayer films with extraordinary adhesion to the substrates and higher hardness than a cBN single film, and the stress of the multilayer film can be reduced to only one forth of that of a cBN single film. These prime technological properties open the route to the mechanical exploitation of cBN films.

Paper Details

Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842S (11 March 2008); doi: 10.1117/12.792275
Show Author Affiliations
H. Q. Li, Hefei Univ. of Technology (China)
K. M. Leung, City Univ. of Hong Kong (Hong Kong China)
W. J. Zhang, City Univ. of Hong Kong (Hong Kong China)


Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications

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