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Proceedings Paper

Influence of substrate temperature on the morphology and thermal resistance of vanadium oxide thin films
Author(s): Xiongbang Wei; Zhiming Wu; Tao Wang; Xiangdong Xu; Jingjing Tang; Yadong Jiang
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Paper Abstract

The dependence of morphology and thermal resistance on the substrate temperature during the deposition of the vanadium oxide thin films (VOx) was studied. Atomic-force microscopy (AFM) analysis results revealed that the structural features of VOx thin films strongly depend on the substrate temperature. Analysis of square resistance and its temperature dependence demonstrated that the difference of morphology introduced by substrate temperature plays an important role on the electrical properties of the films. The width of the thermal resistance hysteresis loop was also observed varied with the substrate temperature.

Paper Details

Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842K (11 March 2008); doi: 10.1117/12.792154
Show Author Affiliations
Xiongbang Wei, Univ. of Electronic Science and Technology of China (China)
Zhiming Wu, Univ. of Electronic Science and Technology of China (China)
Tao Wang, Univ. of Electronic Science and Technology of China (China)
Xiangdong Xu, Univ. of Electronic Science and Technology of China (China)
Jingjing Tang, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications

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