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Proceedings Paper

Substrate effect on the growth and thermal electrical properties of vanadium oxide thin films
Author(s): Xiongbang Wei; Zhiming Wu; Xiangdong Xu; Tao Wang; Jingjing Tang; Yadong Jiang
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Paper Abstract

Vanadium oxide (VOx) thin films were deposited on different substrates by reactive DC magnetron sputtering. Silicon substrate, Si3N4/Si substrate, glass substrate, and α-Al2O3 substrate were adopted in experiments. Results revealed that the structural features of VOx thin films strongly depend on the substrates. Analysis of square resistance and its temperature dependence demonstrated that the crystal structure and the growth mode of VOx films play important roles in the film electrical properties. Experiments demonstrated that substrates have great influence on the growth mode and thermal resistance properties of VOx thin films.

Paper Details

Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842J (11 March 2008); doi: 10.1117/12.792139
Show Author Affiliations
Xiongbang Wei, Univ. of Electronic Science and Technology of China (China)
Zhiming Wu, Univ. of Electronic Science and Technology of China (China)
Xiangdong Xu, Univ. of Electronic Science and Technology of China (China)
Tao Wang, Univ. of Electronic Science and Technology of China (China)
Jingjing Tang, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications

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