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Proceedings Paper

Fabrication and characterization of Si nanotip arrays for Si-based nano-devices
Author(s): Xiangao Zhang; Kui Liu; Kunji Chen; Jun Xu; Zhongyuan Ma; Wei Li; Ling Xu; Xinfan Huang
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Paper Abstract

A simple and efficient technique for fabricating two-dimensional arrays of silicon nanotips by using electron beam lithography (EBL) and reactive ion etching (RIE) was reported. For the RIE processes, two kind of reactive gases, CHF3 and SF6, were used as plasma etching source for Si. The experiment results indicate that the reactive ion etching mechanism is different: the isotropic process for SF6 and anisotropic for CHF3. It is found that the mixed O2/SF6 plasma etching can improve the properties of profile and surface of Si nanotips. Under the condition of ratio ~15%, the 10 nm top size of Si nanotips was obtained.

Paper Details

Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698426 (11 March 2008); doi: 10.1117/12.792018
Show Author Affiliations
Xiangao Zhang, Nanjing Univ. (China)
Kui Liu, Nanjing Univ. (China)
Kunji Chen, Nanjing Univ. (China)
Jun Xu, Nanjing Univ. (China)
Zhongyuan Ma, Nanjing Univ. (China)
Wei Li, Nanjing Univ. (China)
Ling Xu, Nanjing Univ. (China)
Xinfan Huang, Nanjing Univ. (China)


Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications

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