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Proceedings Paper

Image pattern recognition application in SEM imaging system
Author(s): Hengshu Liu; Xinwei Wang
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Paper Abstract

A pattern search algorithm is proposed to search the region that the users are interested in for SEM inspection system. Effective parameters are needed to classify the image patterns of the wafer. Sometimes there are errors in the ROI recognition because of the strong noise and other reasons. A filter is proposed to remove the wrong selections. Test for multi-patterns SEM images show the algorithm meets the requirement of precision and speed.

Paper Details

Date Published: 5 March 2008
PDF: 7 pages
Proc. SPIE 6623, International Symposium on Photoelectronic Detection and Imaging 2007: Image Processing, 662320 (5 March 2008); doi: 10.1117/12.791545
Show Author Affiliations
Hengshu Liu, Henghua Technologies Co., Ltd. (China)
Xinwei Wang, East China Normal Univ. (China)


Published in SPIE Proceedings Vol. 6623:
International Symposium on Photoelectronic Detection and Imaging 2007: Image Processing

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