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Proceedings Paper

Preexposure effect on the fabrication of continuous relief microstructure and advanced method
Author(s): Duoshu Wang; Chongtai Luo; Hongkai Liu; Ziyu Ye
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Paper Abstract

The principle and application of the preexposure in the fabrication of the continuous relief microstructure of diffractive optical element with polar coordinate Laser Direct Writing method were described in the paper. The paper also studied the rule of preexposure effect during the fabrication of continuous relief microstructure. We gave a substitute method of preexposure used in fabrication process of the microstructure and fabricated one kind of continuous relief microstructure successfully with the new method in the end.

Paper Details

Date Published: 12 March 2008
PDF: 5 pages
Proc. SPIE 6624, International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing, 662405 (12 March 2008); doi: 10.1117/12.791056
Show Author Affiliations
Duoshu Wang, Lanzhou Institute of Physics (China)
Chongtai Luo, Lanzhou Institute of Physics (China)
Hongkai Liu, Lanzhou Institute of Physics (China)
Ziyu Ye, Lanzhou Institute of Physics (China)


Published in SPIE Proceedings Vol. 6624:
International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing

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