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Proceedings Paper

Influence of high-temperature vacuum baking on the performance of microchannel plates with an ion barrier film
Author(s): Delong Jiang; Ye Li; Kui Wu; Guozheng Wang; Shencheng Fu; Xin Wang; Qingduo Duanmu; Jingquan Tian
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Paper Abstract

The fabrication of ion barrier film on microchannel plate (MCP) was introduced. The experimental system for high-temperature vacuum baking on MCP and technological condition were given. The measurement on the electrical properties, the dead-voltage and other parameters of MCP with an ion barrier film were shown. The changes before and after high-temperature vacuum baking were also investigated for the MCP with ion barrier film. By analysis and discussion, it was concluded that high-temperature vacuum baking caused the film's thickness changed, the dead-voltage decreased, and the electron gain decreased with the increase of the film's thickness for the MCP with an ion barrier film.

Paper Details

Date Published: 3 March 2008
PDF: 7 pages
Proc. SPIE 6621, International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection, 66210B (3 March 2008); doi: 10.1117/12.790593
Show Author Affiliations
Delong Jiang, Changchun Univ. of Science and Technology (China)
Ye Li, Changchun Univ. of Science and Technology (China)
Kui Wu, Changchun Univ. of Science and Technology (China)
Guozheng Wang, Changchun Univ. of Science and Technology (China)
Shencheng Fu, Changchun Univ. of Science and Technology (China)
Xin Wang, Changchun Univ. of Science and Technology (China)
Qingduo Duanmu, Changchun Univ. of Science and Technology (China)
Jingquan Tian, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 6621:
International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection

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