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Proceedings Paper

Formation of electron multiplier by utilizing the MEMS bulk-silicon-micro-machining technology
Author(s): Yanjun Gao; Qingduo Duanmu; Guozheng Wang; Ye Li; Jingquan Tian
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Paper Abstract

The MEMS silicon-micro-machining is the main MEMS technology, which includes the surface-silicon-micro-machining and the bulk-silicon-micro-machining technology; however the bulk-silicon micro-machining technology has a wide application. In this paper, the formation procession of electron multiplier on n-type Silicon substrate by bulk-silicon-micro-machining technology was investigated. A series of electrochemical etching experiments and tests were carried out in three poles electrobath system using HF electrolyte with different concentration. The rate of photoelectrochemical etching on the macropore depends on a few technological parameters, such as doping concentration, operating bias, illumination intensity of the light, HF concentration, and so on. It was found that the formation possibility of the macropore array is directly correlated with crystal orientation of n-type Silicon substrate.

Paper Details

Date Published: 3 March 2008
PDF: 6 pages
Proc. SPIE 6621, International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection, 662109 (3 March 2008); doi: 10.1117/12.790590
Show Author Affiliations
Yanjun Gao, Changchun Univ. of Science and Technology (China)
Jilin Univ. (China)
Qingduo Duanmu, Changchun Univ. of Science and Technology (China)
Guozheng Wang, Changchun Univ. of Science and Technology (China)
Ye Li, Changchun Univ. of Science and Technology (China)
Jingquan Tian, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 6621:
International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection

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