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Proceedings Paper

Dielectric constant reduction using porous substrates in finline millimetre and submillimetre detectors
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Paper Abstract

Finlines are planar structures which allow broadband and low loss transition from waveguide to planar circuits. Their planar structure and large substrate makes them ideal for integration with other planar circuits and components, allowing the development of an on chip polarimeter. We have developed a method of extending the employment of finlines to thick substrates with high dielectric constants by drilling or etching small holes into the substrate, lowering the effective dielectric constant. We present the results of scale model measurements at 15GHz and cryogenic measurements at 90GHz which illustrate the excellent performance of finline transitions with porous substrates and the suitability of this technique for extending the bandwidth of finline transitions.

Paper Details

Date Published: 19 July 2008
PDF: 9 pages
Proc. SPIE 7020, Millimeter and Submillimeter Detectors and Instrumentation for Astronomy IV, 70202G (19 July 2008); doi: 10.1117/12.788479
Show Author Affiliations
Chris E. North, Univ. of Oxford (United Kingdom)
Michael D. Audley, Cavendish Lab., Univ. of Cambridge (United Kingdom)
Dorota M. Glowacka, Cavendish Lab., Univ. of Cambridge (United Kingdom)
David Goldie, Cavendish Lab., Univ. of Cambridge (United Kingdom)
Paul K. Grimes, Univ. of Oxford (United Kingdom)
Bradley R Johnson, Univ. of Oxford (United Kingdom)
Bruno Maffei, Univ. of Manchester (United Kingdom)
Simon J. Melhuish, Univ. of Manchester (United Kingdom)
Lucio Piccirillo, Univ. of Manchester (United Kingdom)
Giampaolo Pisano, Univ. of Manchester (United Kingdom)
Vassilka N. Tsaneva, Cavendish Lab., Univ. of Cambridge (United Kingdom)
Stafford Withington, Cavendish Lab., Univ. of Cambridge (United Kingdom)
Ghassan Yassin, Univ. of Oxford (United Kingdom)


Published in SPIE Proceedings Vol. 7020:
Millimeter and Submillimeter Detectors and Instrumentation for Astronomy IV
William D. Duncan; Wayne S. Holland; Stafford Withington; Jonas Zmuidzinas, Editor(s)

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