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Proceedings Paper

Design and evaluation of corner compensation patterns for anisotropic etching
Author(s): Xing Chen; Dong Weon Lee; Jong Sung Park
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Paper Abstract

This paper reports corner compensation methods for fabricating the intact mesa structure in MEMS (Micro-Electro-Mechanical System). To investigate the undercutting problem in the mesa structure, over ten corner compensation patterns are designed by computing the relations among a series of parameters, e.g. etching rates in different crystal planes, etching depth, etching times, etc. The compensation patterns are then simulated by the simulation software Anisotropic Crystalline Etch Simulation (ACES) beta 2, the 3D etching simulations are gotten. Various new compensation structures preventing the undercutting of convex corners of (100) silicon in THAH solution are redesigned and optimized based on the simulation results, the fabrication are conducted to verify the feasibility of the corner compensation patterns.

Paper Details

Date Published: 6 December 2007
PDF: 6 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 672364 (6 December 2007); doi: 10.1117/12.787617
Show Author Affiliations
Xing Chen, Chonnam National Univ. (South Korea)
Dong Weon Lee, Chonnam National Univ. (South Korea)
Jong Sung Park, Chonnam National Univ. (South Korea)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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