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Proceedings Paper

Novel interferometry for crystal thickness measurement
Author(s): Lijuan Zhao; Chaowei Tang; Guotian He; Xiaolong Li; Mingyi Fu
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Paper Abstract

Crystal has been widely used in optical fields. In many instances the thickness of optical axis direction of crystal as an important physical parameter needs to be confirmed, so it is necessary to accurately measure the crystal thickness. In this paper we propose to measure the crystal thickness by using the birefringence characteristics of crystal and analyze the feasibility in theory. Furthermore we validated the realization process of the measuring system and the algorithm of calculating crystal thickness by experiments. The repeatable measuring precision was several nanometers.

Paper Details

Date Published: 17 January 2008
PDF: 4 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67235U (17 January 2008); doi: 10.1117/12.783826
Show Author Affiliations
Lijuan Zhao, Chongqing Univ. (China)
Chaowei Tang, Chongqing Univ. (China)
Guotian He, Chongqing Univ. (China)
Shanghai Institute of Optics and Fine Mechanics (China)
Xiaolong Li, Chongqing Univ. (China)
Mingyi Fu, Chongqing Univ. (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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