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Proceedings Paper

Argon (2P-1S) spectral lines measurement in dielectric barrier discharge (DBD) by optical emission spectroscopy
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Paper Abstract

The variations of the intensity of argon (2P→1S) spectral lines with various gas mixing ratios in dielectric barrier discharge (DBD) in air/Ar and N2/Ar admixtures are studied. The relative intensity of Ar I I750.39nm/I763.51nm as a function of experiment conditions (pressure, applied voltage and frequency) in Ar discharge is also measured. In air/Ar and N2/Ar admixtures, it is observed that the higher levels of N2 molecules have quenching selectivity for Ar (2P→1S) spectral lines, and the relative intensity of Ar I I750.39nm/I763.51nm increases with increasing air or N2 concentration in two admixtures, respectively. Both Ar (2P→1S)spectral lines and the relative intensity of Ar I I750.39nm/I763.51nm in N2/Ar admixture are higher than that in air/Ar admixture under the same air and N2 concentration in two admixtures. The relative intensity of Ar I I750.39nm/I763.51nm increases from 0.81 to 1.73 when the concentration of air changes from 10% to 73%, but the relative intensity changes from 1.03 to 3.51 when the concentration of N2 increases from 10% to 73% in N2/Ar admixture at a applied voltage of 10kV, a frequency of 26kHz and an atmosphere pressure. Moreover, in Ar discharge, the results demonstrate that the pressure has great effect on the relative intensity of Ar I I750.39nm/I763.51nm, which decreases with increasing the pressure. But it changes slightly with the applied voltage and the frequency.

Paper Details

Date Published: 27 November 2007
PDF: 6 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67235J (27 November 2007); doi: 10.1117/12.783784
Show Author Affiliations
Lichun Li, Hebei Univ. (China)
Lifang Dong, Hebei Univ. (China)
Hongfang Wang, Hebei Univ. (China)
Fucheng Liu, Hebei Univ. (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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