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Proceedings Paper

Photovoltaic effect of different thickness vanadium oxide thin film
Author(s): Xiongbang Wei; Zhiming Wu; Tao Wang; Shibin Li; Jingjing Tang; Yadong Jiang
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Paper Abstract

Vanadium oxide thin films of different thickness were deposited on P (100) silicon substrates with silicon nitride thin film layer by reactive DC magnetron sputtering method. The current-voltage (I-V) curves of the samples measured in dark environment and different intensity of light environments showed that photovoltaic effect happened when the films exposed on visible light environments. Square resistance (Rs) and temperature coefficient of square resistance (TCRs) of vanadium oxide thin films were also tested in dark and light environment respectively, and the results demonstrated that the Rs was reduced and TCRs was enhanced when vanadium oxide thin films are exposed on light. Such effects changes with the variation of thickness of vanadium oxide thin films.

Paper Details

Date Published: 27 November 2007
PDF: 5 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 672342 (27 November 2007); doi: 10.1117/12.783590
Show Author Affiliations
Xiongbang Wei, Univ. of Electronic Science and Technology of China (China)
Zhiming Wu, Univ. of Electronic Science and Technology of China (China)
Tao Wang, Univ. of Electronic Science and Technology of China (China)
Shibin Li, Univ. of Electronic Science and Technology of China (China)
Jingjing Tang, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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