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Proceedings Paper

High-resolution digital holography for shape measurement of microscopic object
Author(s): Huaying Wang; Baoqun Zhao; Dayong Wang; Guangjun Wang; Jie Zhao
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Paper Abstract

Digital holography is particularly well suited for characterization of microstructure such as surface shape, surface nanostructures and surface roughness. The direct availability of both amplitude and phase information offers a range of versatile processing techniques that can be applied to complex field data, including phase imaging, which is particularly straightforward in digital holography. Based on digital off-axis lensless Fourier transform holographic configuration, the principle of topography by digital holography is analyzed. The wavefront deformation created by numerical Fresnel reconstruction is then studied. Thus the model of phase mask which is a parabolic function and related to the recording parameters is built. The phase mask can be obtained automatically by using digital hologram itself to evaluate automatically and accurately the values of the parameters involved by a curve-fitting procedures applied to the phase data extracted along two profiles, which are defined in the region where sample contributions are constant. The reconstructed wave field can be simply obtained by multiplying the phase mask with Fourier transform of the hologram. Both theoretical analysis and the simulation results show that the procedure proposed by Colomb is more suitable for phase reconstruction of digital off-axis lensless Fourier transform holography. Moreover, the correcting procedure can be applied to compensate high-order aberrations.

Paper Details

Date Published: 17 January 2008
PDF: 7 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67233Y (17 January 2008); doi: 10.1117/12.783578
Show Author Affiliations
Huaying Wang, Hebei Univ of Engineering (China)
Beijing Univ. of Technology (China)
Baoqun Zhao, Hebei Univ. of Engineering (China)
Dayong Wang, Beijing Univ. of Technology (China)
Guangjun Wang, Beijing Univ. of Technology (China)
Henan Institute of Metrology (China)
Jie Zhao, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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