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Proceedings Paper

Research on effects of phase error in phase-shifting interferometer
Author(s): Hongjun Wang; Zhao Wang; Hong Zhao; Ailing Tian; Bingcai Liu
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Paper Abstract

Referring to phase-shifting interferometry technology, the phase shifting error from the phase shifter is the main factor that directly affects the measurement accuracy of the phase shifting interferometer. In this paper, the resources and sorts of phase shifting error were introduction, and some methods to eliminate errors were mentioned. Based on the theory of phase shifting interferometry, the effects of phase shifting error were analyzed in detail. The Liquid Crystal Display (LCD) as a new shifter has advantage as that the phase shifting can be controlled digitally without any mechanical moving and rotating element. By changing coded image displayed on LCD, the phase shifting in measuring system was induced. LCD's phase modulation characteristic was analyzed in theory and tested. Based on Fourier transform, the effect model of phase error coming from LCD was established in four-step phase shifting interferometry. And the error range was obtained. In order to reduce error, a new error compensation algorithm was put forward. With this method, the error can be obtained by process interferogram. The interferogram can be compensated, and the measurement results can be obtained by four-step phase shifting interferogram. Theoretical analysis and simulation results demonstrate the feasibility of this approach to improve measurement accuracy.

Paper Details

Date Published: 17 January 2008
PDF: 6 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67233W (17 January 2008); doi: 10.1117/12.783571
Show Author Affiliations
Hongjun Wang, Xi'an Jiaotong Univ (China)
Xi'an Univ. of Technology (China)
Zhao Wang, Xi'an Jiaotong Univ. (China)
Hong Zhao, Xi'an Jiaotong Univ. (China)
Ailing Tian, Xi'an Univ. of Technology (China)
Bingcai Liu, Xi'an Univ. of Technology (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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