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Proceedings Paper

High quality HfO2 thin films prepared by reactive ion beam assisted deposition
Author(s): Congjuan Wang; Yunxia Jin; Jianda Shao; Zhengxiu Fan
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Paper Abstract

HfO2 films have been deposited with electron beam evaporation of oxide hafnium, reactive evaporation (RE) and reactive ion beam assisted deposition (RIBAD). The optical and structural properties and laser-induced damage threshold of the films have been studied. It was found that HfO2 film deposited with RE has less defects and good uniformity. In addition, the samples deposited with RIBAD have higher refraction index, and can reduce the absorption at a certain condition. Laser-induced damage (LIDT) is under improvement. The crystal structure of the sample deposited with RIBAD is monoclinic, and when the bombardment energy raises, the preferred orientation changes from (002) to (-111).

Paper Details

Date Published: 14 November 2007
PDF: 7 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223X (14 November 2007); doi: 10.1117/12.783567
Show Author Affiliations
Congjuan Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Yunxia Jin, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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