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Proceedings Paper

Deposition and applications of high performance YF3 thin films
Author(s): Linfeng Yang; Changxin Xiong; Mi Zhu
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Paper Abstract

In this work, the improvement of IAD technique to packing density of YF3 films with low absorption over the broadest spectral range, has been investigated. YF3 films were prepared by e-beam evaporation of pure YF3 with Ion Assisted Deposition, DI=0A, 0.8A, 1.0A, 1.2A, (DI is the drive current during deposition of the YF3 films). The packing density of films is inspected generally by water and salt water soak test. The optical properties of all samples were measured and analyzed before and after soak test. The calculation of optical constants for different samples is based on spectrum cures. By comparing the varieties of refractive index and extinction coefficient of different samples, we have found the ideal process parameters of deposition for YF3 film. Then, the 3~5 μm and/or 8-11.5 μm infrared antireflective coatings have been fabricated by using the process parameters of deposition YF3. All samples passed MIL-F-48616 environmental tests and meet with the application demands of military optoelectric equipment.

Paper Details

Date Published: 14 November 2007
PDF: 7 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223Q (14 November 2007); doi: 10.1117/12.783540
Show Author Affiliations
Linfeng Yang, Huazhong Institute of Electro-Optics (China)
Changxin Xiong, Huazhong Institute of Electro-Optics (China)
Mi Zhu, Huazhong Institute of Electro-Optics (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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