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Proceedings Paper

Research on polishing technology based on surface contact MRF
Author(s): Zhi-li Chen; Zhong-da Guo; Wei-guo Liu; Ling-xia Hang; Wei Wang
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Paper Abstract

A novel polishing technology based on surface-contact MRF is introduced. The principle, the magnetic field structure and the mode of motion of this polishing method are described. Through development of uniform ring-like magnetic field, the relevant mechanical device and circulatory system-delivered MRF from the magnetic field center are designed. By using the orthogonal experimental technique on this system, the polishing experiment for the plane K9 glass of Φ 60 is carried out. The experiment result is examined on a Non-contact interferometer Taylor Surf CCI2000. It analyzed the influence of surface roughness and material elimination quantity under the velocity of the principle axis, the intensity of the magnetic field, the velocity of even pendulum of the magnetic pole, the distance between the work-piece and the pole. The diagrams of surface roughness and material elimination quantity under the above craft parameter are given. And the best craft parameter combination is obtained. It is showed by research and experiment that the roughness of the experimental work piece can decrease to Ra 0.86nm from Ra 284.1nm in 50 min under the craft parameter. The intensity of magnetic field 1800G, the velocity of the principle axis 490 rpm, the velocity of even pendulum of the magnetic pole 8rpm, the distance between the work-piece and the pole 1mm are all described.

Paper Details

Date Published: 14 November 2007
PDF: 5 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67223A (14 November 2007); doi: 10.1117/12.783400
Show Author Affiliations
Zhi-li Chen, Xi'an Technological Univ. (China)
Zhong-da Guo, Xi'an Technological Univ. (China)
Wei-guo Liu, Xi'an Technological Univ. (China)
Ling-xia Hang, Xi'an Technological Univ. (China)
Wei Wang, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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