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Proceedings Paper

Numerical and experimental study on SU-8 UV photolithography
Author(s): Liqun Du; Shenmiao Zhu; Jiang Qin; Chong Liu
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Paper Abstract

In this paper, the dimensional precision and tolerance of SU-8 photoresist microstructures are investigated quantitatively. An UV exposure improved model and a dimensional tolerance model based on Fresnel diffraction theory are established by considering the impact of the refractive index and absorption coefficient of SU-8 photoresist on dimensional precision of UV-photolithography. These models can be used to predict the dimension and tolerance of SU-8 photoresist microchannels, and the variation between the dimensional tolerance and the photolithographic parameters. The dimension and tolerance of SU-8 photoresist microstructure are simulated by MATLAB. Based on the UV exposure model, a simple development model was established by swelling theory, which can be used to predict the swelling trend of SU-8 photoresist during developing process. By this development model, the dimension change of SU-8 photoresist due to swelling in developing process has been researched quantitatively.

Paper Details

Date Published: 14 November 2007
PDF: 7 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222T (14 November 2007); doi: 10.1117/12.783364
Show Author Affiliations
Liqun Du, Dalian Univ. of Technology (China)
Shenmiao Zhu, Dalian Univ. of Technology (China)
Jiang Qin, Dalian Univ. of Technology (China)
Chong Liu, Dalian Univ. of Technology (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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