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Proceedings Paper

Wavefront measurement based on active deflectometry
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Paper Abstract

In this paper, a new wavefront measurement is proposed, which is based on active deflectormetry and phase-shift technique. The deflections of imaging rays caused by a phase object could be measured accurately with the phase-shift technique and a removable TFT flat panel to display both the horizontal and vertical sinusoidal intensity patterns respectively, and then the wavefront distribution could be calculated. When a phase object is placed between a display and a calibrated CCD camera, the intensity patterns will be distorted. The distortion can be measured, and another different distortion can be got by moving the display. Then the ray deflections can be measured as well as the gradients of phase shift caused by the object. Therefore the wavefront can be reconstructed. Experimental results show the feasibility of this method. Compared with other techniques, this technique is simpler, cheaper and more flexible.

Paper Details

Date Published: 17 January 2008
PDF: 5 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67232N (17 January 2008); doi: 10.1117/12.783323
Show Author Affiliations
Yuankun Liu, Sichuan Univ. (China)
Xianyu Su, Sichuan Univ. (China)
Qican Zhang, Sichuan Univ. (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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