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Proceedings Paper

Research on the measuring method of the slope error of EUV/x-ray optical elements and measuring apparatus of long trace profiler
Author(s): Changxi Xue; Furong Huo; Chengzhi Zhou; Weicai Deng
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Paper Abstract

The technology on the processing and detection of the extreme ultraviolet radiation and x-ray (EUV/x-ray) optical component is one of the main categories in modern short-wave band optical research. At present, EUV/x-ray optical component are in great demand on the construction of the rapidly developed synchrotron radiant lamp-house and beam of light engineering in developed countries. Now few countries has the ability of developing this kind of optical component with super-smooth surface and high precision and the key technology is processing and detecting technique. In this paper, the author study the measurement method and instrument of the EUV/x-ray optical component, improve the design of the measuring apparatus-long trace profiler LTP already existing, provide a kind of newly long trace profiler LTP-III, which is used to measure slope error.

Paper Details

Date Published: 27 November 2007
PDF: 6 pages
Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67231W (27 November 2007); doi: 10.1117/12.783209
Show Author Affiliations
Changxi Xue, Changchun Univ. of Science and Technology (China)
Furong Huo, Changchun Univ. of Science and Technology (China)
Chengzhi Zhou, Changchun Xinxin Optoelectronic Institute of Spaceflight Technology (China)
Weicai Deng, Changchun Xinxin Optoelectronic Institute of Spaceflight Technology (China)


Published in SPIE Proceedings Vol. 6723:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Junhua Pan; James C. Wyant; Hexin Wang, Editor(s)

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