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Proceedings Paper

Optimization of deposition uniformity in a planet rotation system with precise mask design
Author(s): Jin Luo; Songlin Chen; Ping Ma
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Paper Abstract

Generally, substrates in a planetary rotation system result in coatings with nonuniformity of 2% or greater over apertures of 500mm. However, more accurate, uniform deposition of large-aperture optical coatings is required now. So it is very important to study how to improve the deposition uniformity of large-aperture optical coatings. In this paper, we show that a theoretical model that can forecast the thickness distributions of films, get precise figure of masks, and should optimize the deposition uniformity accurately and fast through fixing the designed masks in the chamber.

Paper Details

Date Published: 14 November 2007
PDF: 4 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222I (14 November 2007); doi: 10.1117/12.783156
Show Author Affiliations
Jin Luo, Chengdu Fine Optical Engineering Research Ctr. (China)
Songlin Chen, Chengdu Fine Optical Engineering Research Ctr. (China)
Ping Ma, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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