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Proceedings Paper

Characterization of novel nonlinear optical polymeric film fabricated from dye doped PMMA
Author(s): Li-kun Han; Ya-dong Jiang; Jun-Sheng Yu; Wei Li; Peng Hao; Chen Li
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Paper Abstract

A novel second-order nonlinear optical active dye was doped in poly methyl methacrylate (PMMA) host with a concentration of approximately 10% by weight. The spin-coated film on indium-tin oxide (ITO) coated glass slide was poled at 110°C for 10 min using a corona-discharge setup to orient NLO chromophores. Results from a systematic evaluation to the film physical and optical properties using atomic force microscope (AFM), UV-VIS spectrometer and second harmonic generation (SHG) measurements were presented. The optical absorption spectra of the film show that the absorption peak wavelength is in the vicinity of 505 nm. After electric poling, the UV-VIS spectra exhibit a decrease in absorption. According to AFM images, the surface of the film before poling was flat and clean, however, this good quality film was changed after poling, resulting in numerous hills and valleys on the surface structure, which were aligned to the poling direction. The SHG coefficient (d33) of the poled polymer at 1064 nm fundamental wavelength was determined with Maker-fringe method and obtained as 17.8 pm/V. The relation between the second-order nonlinear coefficients d33 and d31 for the poled polymer film was also discussed in detail in the paper.

Paper Details

Date Published: 14 November 2007
PDF: 5 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67221T (14 November 2007); doi: 10.1117/12.783026
Show Author Affiliations
Li-kun Han, Univ. of Electronic Science and Technology of China (China)
Ya-dong Jiang, Univ. of Electronic Science and Technology of China (China)
Jun-Sheng Yu, Univ. of Electronic Science and Technology of China (China)
Wei Li, Univ. of Electronic Science and Technology of China (China)
Peng Hao, Univ. of Electronic Science and Technology of China (China)
Chen Li, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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