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Proceedings Paper

Inclusion initiated damage studies at repetition rate pulse laser
Author(s): Fu Dai; Sheng-ming Xiong; Yun-dong Zhang
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Paper Abstract

Theory of laser-induced damage to dielectric films wich contain highly absorbing impurities was proposed previously for single-shot damage of multiple shots. By the model of damage induced by inclusions in dielectric thin-films, with the experiment done by S.Papernov et al who deposited HfO2 thin-films containing gold nanoparticles on a cleaved fused-silica by e-beam evaporation, the absorption cross-section of gold was obtained. Furthermore, the Laser-induced damage threshold induced by inclusions with varies radius and varies repetition frequency was calculated.

Paper Details

Date Published: 14 November 2007
PDF: 5 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67221S (14 November 2007); doi: 10.1117/12.783023
Show Author Affiliations
Fu Dai, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Sheng-ming Xiong, Institute of Optics and Electronics (China)
Yun-dong Zhang, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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