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Proceedings Paper

Simulation on signal processing of focusing and leveling measurement system
Author(s): Xiaoping Li; Feibiao Chen; Zhidan Li
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Paper Abstract

The position and tilt between the image plane of projection lens and wafer surface must be accurately measured and corrected as much as possible. Defocus always occurs when the imaging plane does not consist with the best focus plane. And it reduces the clarity of optical image. It has been reported that proper focusing is a critical factor in the lithography. An automatic focusing and leveling measurement system (FLMS) presented in the reference and widely used in high resolution lithography has been studied. We reveal a detailed principle of the signal processing of the FLMS and evaluate its performance by simulation. The simulation results show that measurement accuracy of the FLMS can be less than 10nm. And this FLMS meets the requirement of high resolution photolithography.

Paper Details

Date Published: 21 November 2007
PDF: 9 pages
Proc. SPIE 6724, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 67241R (21 November 2007); doi: 10.1117/12.782958
Show Author Affiliations
Xiaoping Li, Huazhong Univ. of Science and Technology (China)
Feibiao Chen, Shanghai Micro Electronics Equipment Co., Ltd. (China)
Zhidan Li, Shanghai Micro Electronics Equipment Co., Ltd. (China)


Published in SPIE Proceedings Vol. 6724:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Sen Han; Tingwen Xing; Yanqiu Li; Zheng Cui, Editor(s)

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